Research on the Design and Preparation of Ultra Wideband Anti reflection Film
Abstract: This article focuses on the design and preparation of ultra wideband anti reflection films. Firstly, the key role and research background of ultra wideband anti reflection films in modern optical systems are elaborated. Then, the design principles are analyzed in detail, including traditional design methods based on multi-layer film interference theory and innovative design ideas introducing the concept of gradient refractive index. In terms of preparation technology, the application and advantages and disadvantages of various techniques such as electron beam evaporation, atomic layer deposition, and tilted deposition were discussed. Through experimental research, ultra wideband anti reflection films with specific properties were successfully prepared and their performance was comprehensively characterized. The research results provide important references for the widespread application of ultra wideband anti reflection films in high-power laser systems, solar photovoltaics, and other fields.
2025-08-04